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Grade: Reaction Bonded
Formula: Si₃N₄
Form: Foil/Film/Sheet
Material: Silicon Nitride
Commodity: Ceramics

Reaction Bonded Silicon Nitride Sheet (Si₃N₄)

Reaction Bonded Silicon Nitride (Si₃N₄) Sheet combines high fracture toughness, low density, and strong resistance to thermal and mechanical shock in a flat panel format. This enables its use in high-performance structural, protective, and thermal management applications. Industries apply Si₃N₄ sheets in semiconductor wafer processing, high-wear tooling substrates, and ballistic protection panels. Specific applications include lightweight armor systems, heat spreaders for electronics, and corrosion-resistant baffles in chemical processing. In research, these sheets are employed to study fatigue resistance under thermal cycling, develop next-generation armor composites, and investigate surface coatings for wear and oxidation protection. The sheet format’s strength-to-weight ratio and thermal stability make it invaluable in aerospace, defense, and high-tech manufacturing.
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Tolerances

Foil/Film/Sheet
Thickness ±20%

Material Properties for Ceramics

Chemical Resistance
Element Value
Acids - concentrated Fair
Acids - dilute Good
Alkalis Fair
Halogens Good
Metals Fair
Electrical Properties
Element Value
Dielectric constant 10
Volume resistivity( Ohmcm ) >10⁷@25
Physical Properties
Element Value
Apparent porosity( % ) 15-23
Density( gcm⁻³ ) 2.4
Thermal Properties
Element Value
Upper continuous use temperature( C ) 1200-1500
Specific heat( J K⁻¹ kg⁻¹ ) 690@25°C
Thermal conductivity( W m⁻¹ K⁻¹ ) 10-16@20°C
Coefficient of thermal expansion( x10⁻⁶ K⁻¹ ) 3.3@20-1000°C
Mechanical Properties
Element Value
Tensile modulus( GPa ) 170-220
Hardness - Vickers( kgf mm⁻² ) 800-1000
Shear strength( MPa ) 190-240
Tensile strength( MPa ) 160
Pultrusions
Element Value
Compressive strength( MPa ) 550-650

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