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PMMA Film/Sheet
Available Configurations
Properties common to all products in this list
| Thickness | Size |
|---|---|
| 0.175 mm (film) to 25 mm | 10 x 10 mm to 1000 x 1000 mm |
Need custom configurations? Please contact us.
Key Features
PMMA Film (polymethyl methacrylate) is a transparent thermoplastic film and sheet with a refractive index of 1.49, density of 1.19 g/cm³, tensile strength of 80 MPa, and Rockwell hardness of M92–100, available from 0.175 mm film through to 25 mm structural sheet:
Highest Light Transmission of Any Common Polymer
PMMA provides the highest optical clarity and light transmission of any widely available polymer, combined with UV stability and good weatherability, establishing it as the standard material for optical filters, light guide elements, solar panel encapsulants, and outdoor glazing.
Reference Electron Beam Lithography Resist
PMMA is the most widely studied and used EBL resist, achieving sub-10 nm feature resolution and capable of patterning at single-nanometre length scales under aberration-corrected conditions. It is the reference positive-tone resist for nanofabrication research and sub-100 nm device fabrication.
UV Photolithography Compatibility
Used in UV photolithography across both long and short UV wavelengths, providing versatile positive and negative tone lithographic performance depending on exposure conditions.
Tensile Strength 80 MPa, Rockwell Hardness M92–100
Good mechanical stiffness and surface hardness provide scratch resistance and dimensional stability in optical components, protective glazing, and structural sheet applications.
UV Stability and Weatherability
Resistance to UV-induced yellowing and degradation supports long-term outdoor performance in solar panel encapsulants, architectural glazing, and signage applications where other polymers would discolor or embrittle.
Hot Embossing and Solvent Bonding Compatibility
Compatibility with hot embossing and solvent bonding processes makes PMMA the preferred substrate for microfluidic lab-on-chip device fabrication, where channels and features are imprinted or bonded to produce sealed analytical devices.
Industrial Applications
PMMA Film is used across optics, lithography, microfluidics, and protective glazing wherever optical clarity, UV stability, and compatibility with precision patterning processes determine material selection:
- ✦ Optical Filters, Light Guides and Solar Panel Encapsulants
- Used in optical filters, light guide panels, and solar panel encapsulants where the highest light transmission of any common polymer combined with UV stability and weatherability produces durable, high-performance optical components for indoor and outdoor service.
- ✦ Electron Beam Lithography Resist
- The reference positive-tone EBL resist in nanofabrication research and semiconductor device fabrication, where sub-10 nm feature resolution and compatibility with standard development processes make it the first-choice resist for patterning at the nanometre scale.
- ✦ UV Photolithography
- Applied as a photolithographic resist in UV exposure processes, providing positive or negative tone patterning depending on exposure conditions across a range of UV wavelengths.
- ✦ Microfluidic Lab-on-Chip Devices
- Used as the substrate for microfluidic device fabrication by hot embossing and solvent bonding, where optical transparency for on-chip optical detection, machinability, and bonding compatibility combine to produce functional analytical devices.
- ✦ Protective Glazing and Architectural Applications
- Applied as impact-resistant, UV-stable glazing in architectural, signage, and industrial protective panel applications where optical clarity must be maintained over extended outdoor service life.
- ✦ Biomedical Packaging
- Used as a chemically stable, visually inspectable enclosure material in biomedical packaging where sterility assurance through visual inspection of contents is required.
Material Properties
| Element | Value |
|---|---|
| Abbe number | 57.2 |
| Flammability | HB |
| Radiation resistance | Fair |
| Refractive index | 1.49 |
| Resistance to Ultra-violet | Good |
| Limiting oxygen index( % ) | 17-20 |
| Water absorption - over 24 hours( % ) | 0.2 |
| Density( gcm⁻³ ) | 1.19 |
| Element | Value |
|---|---|
| Acids - concentrated | Good-Poor |
| Acids - dilute | Good-Poor |
| Alcohols | Good-Poor |
| Alkalis | Good |
| Aromatic hydrocarbons | Poor |
| Greases and Oils | Good |
| Halogenated Hydrocarbons | Poor |
| Halogens | Poor |
| Ketones | Poor |
| Element | Value |
|---|---|
| Dielectric constant @1MHz | 2.6 |
| Dissipation factor @ 1MHz | 0.014 |
| Dielectric strength( kV mm⁻¹ ) | 15 |
| Surface resistivity( Ohm/sq ) | 10¹⁴ |
| Volume resistivity( Ohmcm ) | 2-14 x 10¹⁵ |
| Element | Value |
|---|---|
| Hardness - Rockwell | M92-100 |
| Poisson's ratio | 0.35-0.4 |
| Elongation at break( % ) | 2.5-4 |
| Tensile modulus( GPa ) | 2.4-3.3 |
| Izod impact strength( J m⁻¹ ) | 16-32 |
| Tensile strength( MPa ) | 80 |
| Element | Value |
|---|---|
| Heat-deflection temperature - 0.45MPa( C ) | 105 |
| Heat-deflection temperature - 1.8MPa( C ) | 95 |
| Lower working temperature( C ) | -40 |
| Upper working temperature( C ) | 50-90 |
| Specific heat( J K⁻¹ kg⁻¹ ) | 1400-1500 |
| Thermal conductivity( W m⁻¹ K⁻¹ ) | 0.17-0.19@23°C |
| Coefficient of thermal expansion( x10⁻⁶ K⁻¹ ) | 70-77 |
Tolerances
| Thickness | ±20% | |
|---|---|---|
| Linear dimension | <100mm | ±1mm |
| Linear dimension | >=100mm | +2 / -1% |