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Formula: NiO
Form: Sputtering Target
Material: Nickel Oxide
CAS Number: 1313-99-1
Commodity: Compounds
Thickness:
3mm
Production Method:
Hot Pressed
Hazard Pictogram:
GHS07, GHS08
Nickel oxide sputtering target disks are available in 2 variations. Precisely fabricated, these disks enable uniform deposition of nickel oxide thin films via sputtering. They feature high density and uniform composition ideal for thin film deposition. Our nickel oxide targets are used in applications like smart windows, gas sensors and anti-reflective coatings.
Health hazard/Hazardous to the ozone layer
Serious health hazard
Material Properties for Compounds
Thermal Properties
| Element | Value |
|---|---|
| Melting point( C ) | 1984 |
Physical Properties
| Element | Value |
|---|---|
| Density( gcm⁻³ ) | 6.67 |
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