Zinc Oxide/Gallium Oxide (2% GZO) Sputtering Target

We now offer Zinc Oxide/Gallium Oxide (2% GZO) Sputtering Targets as part of our extensive range of metal oxide sputtering targets. This 2% gallium doped zinc oxide disc exhibits high electrical conductivity and excellent optical transparency. Sputtered zinc oxide films are used in a variety of applications including transparent conducting oxides, photovoltaic cells, and thin film transistors. With high purity and uniform composition, these 2% GZO discs are ideal for reactive sputtering of ultra-thin transparent conductive oxide layers.

Zinc Oxide/Gallium Oxide (2% GZO) Sputtering Target Formula: ZnO 98 / Ga2O3 2
Thickness: 5mm
Diameter: 25mm
UOM Code: 315-266-36

709.29 each Ex VAT

Discounts applied for volume purchases

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Zinc Oxide/Gallium Oxide (2% GZO) Sputtering Target