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Magnesium Oxide Sputtering Target
Magnesium Oxide Sputtering Targets are available in 5 variations. Magnesium oxide is an electrical insulator with a high thermal conductivity. Being available in a disk shape allows it to be easily integrated into sputtering systems for thin film deposition onto substrates. With tunable properties through doping, magnesium oxide films are used in magnetic tunnel junctions, sensors and microelectronics.
Formula: MgO
Percentage Purity: 99.9%
Thickness: 6mm
Diameter: 50.8mm
CAS Number: 1309-48-4
UOM Code: 589-447-41
Percentage Purity: 99.9%
Thickness: 6mm
Diameter: 50.8mm
CAS Number: 1309-48-4
UOM Code: 589-447-41
SKU: 1000131883
Product Code: MG50-ST-000200
$855.20
each
- Buy 5 for $692.71 each and save 19%
- Buy 10 for $632.85 each and save 26%
No Minimum order
Free technical support
*Free delivery worldwide
Material Properties for Compounds
Physical Properties
| Element | Value |
|---|---|
| Density( gcm⁻³ ) | 3.58 |
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Titanium Dioxide Powder Formula: TiO₂ 99.6%
Maximum Particle Size: 45µm
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CAS Number: 13463-67-7
UOM Code: 197-608-67
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Zinc Oxide Powder Formula: ZnO
Percentage Purity: 99.999%
Maximum Particle Size: 45µm
Weight: 200g
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Tungsten Trioxide Powder Formula: WO₃
Maximum Particle Size: 45µm
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CAS Number: 1314-35-8
UOM Code: 365-623-61
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Titanium Dioxide Sheet Formula: TiO₂ 99.6%
Thickness: 2mm
Length 1: 25mm
Length 2: 25mm
CAS Number: 13463-67-7
UOM Code: 625-195-31
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Zinc Arsenide Powder Formula: Zn₃As₂
Percentage Purity: 99%
Maximum Particle Size: 150µm
Weight: 200g
UOM Code: 032-413-58
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