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Grade: Ion Implanted
Formula: Ti
Form: Disk
Material: Titanium
CAS Number: 7440-32-6
Commodity: Metals
Purity: 99.6%
Thickness: 0.5mm
Ion Implanted Titanium Disk features a surface-engineered layer that dramatically enhances its mechanical and biological performance, making it a preferred choice for advanced biomedical applications. The process of ion implantation—typically involving elements such as carbon, oxygen, or fluorine—modifies only the atomic layers at the surface, inducing amorphization, enhancing microhardness, and significantly improving resistance to wear and corrosion without altering the bulk titanium properties. This disk is extensively applied in orthopedic implants, dental fixtures, and surgical tools where fatigue resistance and extended surface lifespan are critical. Specifically, ion implantation improves osseointegration by promoting favorable protein adsorption and cellular adhesion, while also inhibiting bacterial colonization—key features for long-term implant stability. Medical devices enhanced with such surfaces show reduced inflammatory response and improved bonding at the tissue interface. The disk’s ability to preserve dimensional precision while delivering superior biocompatibility highlights its role in pushing forward next-generation implantable systems.
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Tolerances

Disc
Thickness >0.05mm ±10%
Thickness <0.01mm ±25%
Thickness 0.01mm - 0.05mm ±15%

Material Properties for Metals

Atomic Properties
Element Value
Atomic number 22
Crystal structure Hexagonal close packed
Electronic structure Ar 3d² 4s²
Valences shown 2,3,4
Atomic weight( amu ) 47.88
Thermal neutron absorption cross-section( Barns ) 6.1
Photo-electric work function( eV ) 4.1
Natural isotope distribution( Mass No./% ) 50/ 5.3
Natural isotope distribution( Mass No./% ) 49/ 5.5
Natural isotope distribution( Mass No./% ) 46/ 8.0
Natural isotope distribution( Mass No./% ) 48/ 73.7
Natural isotope distribution( Mass No./% ) 47/ 7.5
Atomic radius - Goldschmidt( nm ) 0.147
Ionisation potential( No./eV ) 3/ 27.5
Ionisation potential( No./eV ) 4/ 43.3
Ionisation potential( No./eV ) 5/ 99.2
Ionisation potential( No./eV ) 1/ 6.82
Ionisation potential( No./eV ) 2/ 13.6
Ionisation potential( No./eV ) 6/ 119
Mechanical Properties
Element Value
Material condition Polycrystalline
Material condition Annealed
Poisson's ratio 0.361
Poisson's ratio 0.361
Poisson's ratio -
Bulk modulus( GPa ) 108.4
Bulk modulus( GPa ) -
Bulk modulus( GPa ) 108.4
Tensile modulus( GPa ) -
Tensile modulus( GPa ) 120.2
Tensile modulus( GPa ) 120.2
Izod toughness( J m⁻¹ ) 61
Izod toughness( J m⁻¹ ) 61
Hardness - Vickers( kgf mm⁻² ) 60
Hardness - Vickers( kgf mm⁻² ) 60
Tensile strength( MPa ) 230-460
Tensile strength( MPa ) 230-460
Yield strength( MPa ) 140-250
Yield strength( MPa ) 140-250
Electrical Properties
Element Value
Electrical resistivity( µOhmcm ) 54@20@20°C
Superconductivity critical temperature( K ) 0.4
Temperature coefficient( K⁻¹ ) 0.0038@0-100°C
Physical Properties
Element Value
Boiling point( C ) 3287
Density( gcm⁻³ ) 4.5@20°C
Thermal Properties
Element Value
Melting point( C ) 1660
Latent heat of evaporation( J g⁻¹ ) 8893
Latent heat of fusion( J g⁻¹ ) 365
Specific heat( J K⁻¹ kg⁻¹ ) 523@25°C
Thermal conductivity( W m⁻¹ K⁻¹ ) 21.9@0-100°C
Coefficient of thermal expansion( x10⁻⁶ K⁻¹ ) 8.9@0-100°C

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