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Formula: In 95/Sn 5
Form: Sputtering Target
Material: Indium/Tin
Commodity: Alloys
Thickness: 3mm

Indium/Tin Alloy Sputtering Target (In95/Sn5)

Indium Tin Alloy Sputtering Target (In95/Sn5) provides excellent adhesion, uniformity, and conductivity in thin-film deposition processes. The alloy combines indium’s softness and low vapor pressure with tin’s strength, producing stable sputtered films with controlled microstructure. Industries such as electronics, energy storage, and photonics employ these targets to fabricate transparent conductors, solar coatings, and thin-film interconnects. Technologies benefiting include OLED electrodes, thin-film resistors, and advanced photovoltaic absorbers. Research explores stress–strain relationships in sputtered alloys, interfacial stability, and optimization of films for high-performance optoelectronic devices. The target format supports reproducibility, scalability, and efficient material utilization in both laboratory experiments and industrial systems. Its ability to merge low-temperature processing with consistent film quality makes In95/Sn5 sputtering targets indispensable in advanced device engineering.
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Material Properties for Alloys

Thermal Properties
Element Value
Melting point( C ) 238
Physical Properties
Element Value
Density( gcm⁻³ ) 7.14

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