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Hot-pressed Silicon Carbide Sputtering Target

Silicon carbide offers properties like high hardness, chemical inertness and heat resistance. These disks can be used to create thin films in fields like electronics, optics and surface engineering. With multiple size variations to choose from, our range of Silicon Carbide Sputtering Target disks provide customizable solutions for research and industrial sputtering processes.
Formula: SiC
Thickness: 1.5mm
Diameter: 20mm
UOM Code: 068-750-62
SKU: 1000009580
Product Code: SJ60-ST-000150
Technical Data Sheet
Safety Data Sheet
$345.53
each
  • Buy 5 for $279.88 each and save 19%
  • Buy 10 for $255.70 each and save 26%
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Material Properties for Ceramics

Chemical Resistance
Element Value
Acids - concentrated Good
Acids - dilute Good
Alkalis Good-Poor
Halogens Good-Poor
Metals Fair
Electrical Properties
Element Value
Dielectric constant 40
Volume resistivity( Ohmcm ) 10³-10⁵@25
Physical Properties
Element Value
Apparent porosity( % ) 0
Density( gcm⁻³ ) 3.15
Thermal Properties
Element Value
Melting point( C ) 2650-2950
Upper continuous use temperature( C ) 1500-1650
Specific heat( J K⁻¹ kg⁻¹ ) 670-710@25°C
Thermal conductivity( W m⁻¹ K⁻¹ ) 90-160@20°C
Coefficient of thermal expansion( x10⁻⁶ K⁻¹ ) 4.5@20-1000°C
Mechanical Properties
Element Value
Tensile modulus( GPa ) 200-500
Hardness - Vickers( kgf mm⁻² ) 2400-2800
Shear strength( MPa ) 210-380
Tensile strength( MPa ) 400
Pultrusions
Element Value
Compressive strength( MPa ) 1000-1700
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