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Formula: HfO₂
Form: Sputtering Target
Material: Hafnium Oxide
CAS Number: 12055-23-1
Commodity: Compounds
Thickness:
3mm
Production Method:
Hot Pressed
Hafnium Oxide Sputtering Targets are made from a high-purity oxide material. These disks enable the deposition of thin films using sputter coating techniques. The controlled composition and dense structure of these targets make them ideal for producing hafnium oxide layers with very low impurity levels. Key applications for hafnium oxide thin films include optical coatings, microelectronics and protective coatings.
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Tungsten Trioxide Powder Formula: WO₃
Maximum Particle Size: 45µm
Weight: 50g
CAS Number: 1314-35-8
UOM Code: 365-623-61
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Zinc Oxide Powder Formula: ZnO
Percentage Purity: 99.999%
Maximum Particle Size: 45µm
Weight: 200g
UOM Code: 048-260-33
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Titanium Dioxide Powder Formula: TiO₂ 99.6%
Maximum Particle Size: 45µm
Weight: 500g
CAS Number: 13463-67-7
UOM Code: 197-608-67
eachStarting at $227.11
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Zinc Arsenide Powder Formula: Zn₃As₂
Percentage Purity: 99%
Maximum Particle Size: 150µm
Weight: 200g
UOM Code: 032-413-58
eachStarting at $294.94
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Titanium Dioxide Sheet Formula: TiO₂ 99.6%
Thickness: 2mm
Length 1: 25mm
Length 2: 25mm
CAS Number: 13463-67-7
UOM Code: 625-195-31
eachStarting at $573.90
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