Zirconium Sputtering Target (Hf > 0.2%)

Hafnium (more than 0.2% Zirconium) Sputtering Target provides a high-purity metallic target ideal for producing thin films with superior thermal stability, oxidation resistance, and electrical properties. Its stable microstructure ensures uniform sputtering performance, critical for advanced electronics and coatings. Industries including microelectronics, aerospace, and nuclear energy employ these targets in thin film deposition, barrier coatings, and functional layers requiring high-temperature resilience. Specific applications include diffusion barriers in semiconductor devices, protective coatings for aerospace components, and thin films for nuclear research instrumentation. In research, hafnium sputtering targets are studied for dielectric properties in microelectronics, corrosion resistance in aggressive environments, and behavior under plasma conditions. Their ability to produce durable, high-performance films makes them essential in electronics, aerospace, and advanced coating technologies.

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Properties

Reference & Citations

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Material Properties for Metals

Atomic Properties

Element	Value
Atomic number	40
Crystal structure	Hexagonal close packed
Electronic structure	Kr 4d² 5s²
Valences shown	2,3,4
Atomic weight( amu )	91.22
Thermal neutron absorption cross-section( Barns )	0.182
Photo-electric work function( eV )	3.8
Natural isotope distribution( Mass No./% )	96/ 2.8
Natural isotope distribution( Mass No./% )	92/ 17.1
Natural isotope distribution( Mass No./% )	91/ 11.2
Natural isotope distribution( Mass No./% )	94/ 17.5
Natural isotope distribution( Mass No./% )	90/ 51.4
Atomic radius - Goldschmidt( nm )	0.16
Ionisation potential( No./eV )	4/ 34.34
Ionisation potential( No./eV )	Jun-99
Ionisation potential( No./eV )	2/ 13.13
Ionisation potential( No./eV )	1/ 6.84
Ionisation potential( No./eV )	5/ 81.5
Ionisation potential( No./eV )	3/ 22.99

Mechanical Properties

Element	Value
Material condition	Polycrystalline
Material condition	Soft
Poisson's ratio	0.38
Poisson's ratio	0.38
Bulk modulus( GPa )	89.8
Bulk modulus( GPa )	89.8
Tensile modulus( GPa )	98
Tensile modulus( GPa )	98
Hardness - Vickers( kgf mm⁻² )	85-100
Tensile strength( MPa )	350-390
Yield strength( MPa )	250-310

Electrical Properties

Element	Value
Electrical resistivity( µOhmcm )	44@20@20°C
Superconductivity critical temperature( K )	0.61
Temperature coefficient( K⁻¹ )	0.0044@0-100°C
Thermal emf against Pt (cold 0C - hot 100C)( mV )	1.17

Physical Properties

Element	Value
Boiling point( C )	4377
Density( gcm⁻³ )	6.49@20°C

Thermal Properties

Element	Value
Melting point( C )	1852
Latent heat of evaporation( J g⁻¹ )	6360
Latent heat of fusion( J g⁻¹ )	211
Specific heat( J K⁻¹ kg⁻¹ )	281@25°C
Thermal conductivity( W m⁻¹ K⁻¹ )	22.7@0-100°C
Coefficient of thermal expansion( x10⁻⁶ K⁻¹ )	5.9@0-100°C