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Gold/Palladium Alloy Sputtering Target (Au80/Pd20)

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Composition: Au 80/Pd 20 Form: Sputtering Target Material: Gold/Palladium Commodity: Precious Metals
Gold/Palladium Alloy Sputtering Target (Au80/Pd20) combines the excellent electrical conductivity, corrosion resistance, and optical stability of gold with the hardness, wear resistance, and catalytic activity of palladium. The 80/20 composition delivers an optimal balance between film adhesion, durability, and electronic performance, making it a preferred choice for thin-film deposition in microelectronics, optoelectronics, and high-performance coatings. Au–Pd sputtering targets are used to produce uniform, adherent coatings for precision connectors, reflective optical elements, and diffusion-resistant barrier layers in semiconductor devices. The alloy’s ability to form stable, homogeneous films under varying deposition conditions is critical in aerospace instrumentation, high-vacuum optics, and catalysis research. In scientific contexts, Au80/Pd20 targets are employed to investigate bimetallic surface interactions, nanostructured catalyst behavior, and tailored optical coatings with low emissivity and high reflectivity. The combination of noble metal resilience and engineered sputtering performance ensures its ongoing value in both industrial production and advanced materials research.
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Available Configurations

Properties common to all products in this list

Composition: Au 80/Pd 20 Form: Sputtering Target Material: Gold/Palladium Commodity: Precious Metals

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Tolerances

Disk
Thickness <0.01mm ±25%
Thickness =<0.05mm ±15%
Thickness >0.05mm ±10%
Diameter ±0.5mm