Images are for guidance only and might not represent the final product.

Indium Oxide/Tin Oxide Sputtering Target

Formula: In₂O₃ 90 /SnO₂ 10
Form: Sputtering Target
Material: Indium Oxide/Tin Oxide
Commodity: Compounds
Production Method: Hot Pressed
Our Indium Oxide/Tin Oxide Sputtering Targets are used for thin film deposition and coating. With 5 variations in the range, these disks have tunable electrical conductivity and optical transparency that make them ideal for applications like transparent electrodes in touch screens, flat panel displays, smart windows and photovoltaics. The controlled composition and high purity of these sputtering target disks allow for reliable, high quality thin film deposition.
Technical Data Sheet Safety Data Sheet Tolerance Properties
each

We are collecting your products, please wait!...

Shipping restrictions and charges
may apply for some hazardous materials.

Material Properties for Compounds

Physical Properties
Element Value
Density( gcm⁻³ ) 7.16

Can't find what you're looking for? For customized options

Other Customers Purchased