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Indium Oxide/Tin Oxide Sputtering Target
Our Indium Oxide/Tin Oxide Sputtering Targets are used for thin film deposition and coating. With 5 variations in the range, these disks have tunable electrical conductivity and optical transparency that make them ideal for applications like transparent electrodes in touch screens, flat panel displays, smart windows and photovoltaics. The controlled composition and high purity of these sputtering target disks allow for reliable, high quality thin film deposition.
Formula: In₂O₃ 90 /SnO₂ 10
Thickness: 6mm
Diameter: 50.8mm
Production Method: Hot Pressed
UOM Code: 170-388-85
Thickness: 6mm
Diameter: 50.8mm
Production Method: Hot Pressed
UOM Code: 170-388-85
SKU: 1000062949
Product Code: IN51-ST-000200
£573.28
each
- Buy 5 for £464.36 each and save 19%
- Buy 10 for £424.23 each and save 26%
No Minimum order
Free technical support
*Free delivery worldwide
Material Properties for Compounds
Physical Properties
| Element | Value |
|---|---|
| Density( gcm⁻³ ) | 7.16 |
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