Zirconium Nitride Sputtering Target

Zirconium Nitride Sputtering Targets are made from high-purity zirconium nitride. With excellent hardness, electrical conductivity and thermal stability, they enable the deposition of thin zirconium nitride films via sputtering. Zirconium nitride films are used as wear-resistant coatings, diffusion barriers in microelectronics, and decorative coatings. We offer Zirconium Nitride Sputtering Targets in a variety of sizes and thicknesses to suit different deposition processes and equipment.