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Titanium Nitride Sputtering Target
Our Titanium Nitride Sputtering Target comes in 5 variations to suit different deposition requirements. Titanium nitride coatings offer high hardness, wear resistance and golden coloration. Applications for titanium nitride sputtered films include decorative coatings, diffusion barriers in microelectronics, and protective coatings on cutting tools and medical implants. With our range of sizes, Titanium Nitride Sputtering Targets provides flexibility for thin film deposition across industrial and scientific settings.
Formula: TiN
Thickness: 3mm
Diameter: 25.4mm
Production Method: Hot Pressed
CAS Number: 25583-20-4
UOM Code: 757-042-16
Thickness: 3mm
Diameter: 25.4mm
Production Method: Hot Pressed
CAS Number: 25583-20-4
UOM Code: 757-042-16
SKU: 1000215936
Product Code: TI56-ST-000100
£304.29
each
- Buy 5 for £246.47 each and save 19%
- Buy 10 for £225.17 each and save 26%
No Minimum order
Free technical support
*Free delivery worldwide
Material Properties for Compounds
Physical Properties
| Element | Value |
|---|---|
| Density( gcm⁻³ ) | 5.22 |
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Niobium Nitride Powder Formula: NbN
Percentage Purity: 99%
Maximum Particle Size: 150µm
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UOM Code: 028-955-32
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Vanadium Nitride Powder Formula: VN
Maximum Particle Size: 150µm
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Silicon Nitride Powder Formula: Si₃N₄
Percentage Purity: 99%
Weight: 200g
Class: Nanomaterials
Structure: Amorphous
UOM Code: 130-360-70
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Titanium Nitride Powder Formula: TiN
Percentage Purity: 99%
Maximum Particle Size: 45µm
Weight: 500g
CAS Number: 25583-20-4
UOM Code: 345-789-62
eachStarting at £174.56
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each
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