Hafnium > 0.2% Zirconium Sputtering Target

We offer a range of Hafnium > 0.2% Zirconium Sputtering Targets, with 3 sizes and thicknesses to meet different application needs. They’re are made from zirconium doped with a small percentage of hafnium to enhance certain properties. The hafnium-zirconium alloy provides high thermal stability, corrosion resistance and uniform sputtering rates. These sputtering target discs are commonly used in semiconductor chip manufacturing and thin film coatings for optical, electrical and thermal applications.

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