Hot-pressed Silicon Carbide Sputtering Target

Hot-pressed Silicon Carbide Sputtering Target are available in diameters ranging from 1" to 6", providing options for a variety of sputtering applications. Silicon carbide offers properties like high hardness, chemical inertness and heat resistance. These discs can be used to create thin films in fields like electronics, optics and surface engineering. With multiple size variations to choose from, our range of Silicon Carbide Sputtering Target discs provide customizable solutions for research and industrial sputtering processes.

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