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Hot-pressed Silicon Nitride Sputtering Target
Hot-pressed Silicon Nitride Sputtering Targets are a high-purity, high-density ceramic material offered within our extensive range of sputtering targets. With 6 size variations available, they can be customized for use as sputtering targets in thin film deposition systems. Their silicon nitride composition provides properties like high hardness, wear resistance and chemical inertness, making them useful for thin films applications such as protective coatings, semiconductor devices and optical coatings.
Formula: Si₃N₄
Thickness: 3mm
Diameter: 25.4mm
Production Method: Hot Pressed
UOM Code: 996-913-18
Thickness: 3mm
Diameter: 25.4mm
Production Method: Hot Pressed
UOM Code: 996-913-18
SKU: 1000183174
Product Code: SJ61-ST-000100
£373.45
each
- Buy 5 for £302.49 each and save 19%
- Buy 10 for £276.35 each and save 26%
No Minimum order
Free technical support
*Free delivery worldwide
Material Properties for Ceramics
Chemical Resistance
| Element | Value |
|---|---|
| Acids - concentrated | Fair |
| Acids - dilute | Good |
| Alkalis | Good-Poor |
| Halogens | Good |
| Metals | Fair |
Electrical Properties
| Element | Value |
|---|---|
| Dielectric constant | 10 |
| Volume resistivity( Ohmcm ) | 10¹²-10¹⁵@25 |
Physical Properties
| Element | Value |
|---|---|
| Apparent porosity( % ) | 0 |
| Density( gcm⁻³ ) | 3.11 |
Thermal Properties
| Element | Value |
|---|---|
| Sublimation point( C ) | 1900 |
| Upper continuous use temperature( C ) | 1100-1650 |
| Specific heat( J K⁻¹ kg⁻¹ ) | 680-800@25°C |
| Thermal conductivity( W m⁻¹ K⁻¹ ) | 15-43@20°C |
| Coefficient of thermal expansion( x10⁻⁶ K⁻¹ ) | 3.3@20-1000°C |
Mechanical Properties
| Element | Value |
|---|---|
| Tensile modulus( GPa ) | 280-310 |
| Hardness - Vickers( kgf mm⁻² ) | 1700-2200 |
| Shear strength( MPa ) | 480-960 |
| Tensile strength( MPa ) | 400-580 |
Pultrusions
| Element | Value |
|---|---|
| Compressive strength( MPa ) | 2000-3500 |
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Nickel/Vanadium Alloy Sputtering Target (Ni93/V 7) Formula: Ni93/V 7
Thickness: 3mm
Diameter: 76.2mm
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Zinc Oxide/Aluminum Oxide Sputtering Target (ZnO 98/Al₂O₃ 2) Formula: ZnO 98/Al₂O₃ 2
Thickness: 3mm
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Nickel/Iron/Molybdenum Alloy Sputtering Target (Ni80/Fe15.5/Mo 4.5) Formula: Ni80/Fe15.5/Mo 4.5
Thickness: 3mm
Diameter: 50.8mm
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Zinc Oxide Sputtering Target Formula: ZnO
Thickness: 3mm
Diameter: 75mm
CAS Number: 1314-13-2
UOM Code: 239-008-91
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Zinc Oxide/Gallium Oxide (2% GZO) Sputtering Target Formula: ZnO 98 / Ga2O3 2
Thickness: 5mm
Diameter: 25mm
UOM Code: 315-266-36
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Zinc Oxide/Aluminum Oxide Sputtering Target (ZnO 99/Al₂O₃ 1) Formula: ZnO 99/Al₂O₃ 1
Thickness: 3mm
Diameter: 25.4mm
UOM Code: 872-065-75
eachStarting at £340.33
Discounts applied for volume purchases
