Images are for guidance only and might not represent the final product.

Hot-pressed Silicon Carbide Sputtering Target

Formula: SiC
Form: Sputtering Target
Material: Hot-pressed Silicon Carbide
Commodity: Ceramics
Silicon carbide offers properties like high hardness, chemical inertness and heat resistance. These disks can be used to create thin films in fields like electronics, optics and surface engineering. With multiple size variations to choose from, our range of Silicon Carbide Sputtering Target disks provide customizable solutions for research and industrial sputtering processes.
Technical Data Sheet Safety Data Sheet Tolerance Properties
each

We are collecting your products, please wait!...

Shipping restrictions and charges
may apply for some hazardous materials.

Material Properties for Ceramics

Chemical Resistance
Element Value
Acids - concentrated Good
Acids - dilute Good
Alkalis Good-Poor
Halogens Good-Poor
Metals Fair
Electrical Properties
Element Value
Dielectric constant 40
Volume resistivity( Ohmcm ) 10³-10⁵@25
Physical Properties
Element Value
Apparent porosity( % ) 0
Density( gcm⁻³ ) 3.15
Thermal Properties
Element Value
Melting point( C ) 2650-2950
Upper continuous use temperature( C ) 1500-1650
Specific heat( J K⁻¹ kg⁻¹ ) 670-710@25°C
Thermal conductivity( W m⁻¹ K⁻¹ ) 90-160@20°C
Coefficient of thermal expansion( x10⁻⁶ K⁻¹ ) 4.5@20-1000°C
Mechanical Properties
Element Value
Tensile modulus( GPa ) 200-500
Hardness - Vickers( kgf mm⁻² ) 2400-2800
Shear strength( MPa ) 210-380
Tensile strength( MPa ) 400
Pultrusions
Element Value
Compressive strength( MPa ) 1000-1700

Can't find what you're looking for? For customized options

Other Customers Purchased