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Hot-pressed Boron Carbide Sputtering Target

Formula: B₄C
Form: Sputtering Target
Material: Hot-pressed Boron Carbide
CAS Number: 12069-32-8
Commodity: Ceramics
Hot-pressed boron carbide sputtering target disks are available in a variety of sizes and different levels of purity. They’re made by hot pressing boron carbide powder to produce a dense target. Boron carbide has excellent hardness and wear resistance properties that makes these targets ideal for thin film deposition and coating applications requiring high hardness, such as hard protective coatings and semiconductors. With our range of sizes and purities, these disks can suit many sputtering needs.
Technical Data Sheet Safety Data Sheet Tolerance Properties
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Material Properties for Ceramics

Chemical Resistance
Element Value
Acids - concentrated Fair
Acids - dilute Good
Alkalis Fair
Halogens Fair
Metals Fair
Physical Properties
Element Value
Apparent porosity( % ) <3
Density( gcm⁻³ ) 2.45-2.52
Thermal Properties
Element Value
Melting point( C ) 2450
Upper continuous use temperature( C ) 600-800
Specific heat( J K⁻¹ kg⁻¹ ) 950@25°C
Thermal conductivity( W m⁻¹ K⁻¹ ) 30-90@20°C
Coefficient of thermal expansion( x10⁻⁶ K⁻¹ ) 5.6@20-1000°C
Mechanical Properties
Element Value
Tensile modulus( GPa ) 440-470
Hardness - Knoop( kgf mm⁻² ) 2800-3500
Hardness - Vickers( kgf mm⁻² ) 3200
Tensile strength( MPa ) 350
Pultrusions
Element Value
Compressive strength( MPa ) 1400-3400
Electrical Properties
Element Value
Volume resistivity( Ohmcm ) 0.1-10@25

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