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Hafnium Oxide Sputtering Target

Formula: HfO₂
Form: Sputtering Target
Material: Hafnium Oxide
CAS Number: 12055-23-1
Commodity: Compounds
Thickness: 3mm
Production Method: Hot Pressed
Hafnium Oxide Sputtering Targets are made from a high-purity oxide material. These disks enable the deposition of thin films using sputter coating techniques. The controlled composition and dense structure of these targets make them ideal for producing hafnium oxide layers with very low impurity levels. Key applications for hafnium oxide thin films include optical coatings, microelectronics and protective coatings.
Safety Data Sheet Tolerance Properties
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