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Alumina Sputtering Target

Available in 15 variations, Alumina Sputtering Targets are ceramic disks used as deposition targets for thin film sputtering processes. These high purity Al2O3 disks provide researchers with a selection of diameters and thicknesses for use in optical coating and semiconductor applications where alumina's electrical insulation, high hardness and chemical resistance are desired properties. Sputtering Target disks complement our extensive catalog of materials for research and development.
Formula: Al₂O₃
Percentage Purity: 99.5%
Thickness: 5mm
Diameter: 50mm
CAS Number: 1344-28-1
UOM Code: 275-986-52
SKU: 1000024502
Product Code: AL60-ST-000201
Technical Data Sheet
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£188.69
each
  • Buy 5 for £152.84 each and save 19%
  • Buy 10 for £139.63 each and save 26%
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Material Properties for Ceramics

Chemical Resistance
Element Value
Acids - concentrated Good
Acids - dilute Good
Alkalis Good
Halogens Good
Metals Good
Electrical Properties
Element Value
Dielectric constant 9-10.1
Dielectric strength( kV mm⁻¹ ) Oct-35
Volume resistivity( Ohmcm ) >10¹⁴@25
Physical Properties
Element Value
Apparent porosity( % ) 0
Water absorption - saturation( % ) 0
Density( gcm⁻³ ) 3.9
Thermal Properties
Element Value
Melting point( C ) 2100
Upper continuous use temperature( C ) 1700
Specific heat( J K⁻¹ kg⁻¹ ) 850-900@25°C
Thermal conductivity( W m⁻¹ K⁻¹ ) 26-35@20°C
Coefficient of thermal expansion( x10⁻⁶ K⁻¹ ) 8@20-1000°C
Mechanical Properties
Element Value
Tensile modulus( GPa ) 300-400
Hardness - Knoop( kgf mm⁻² ) 2100
Hardness - Vickers( kgf mm⁻² ) 1500-1650
Shear strength( MPa ) 330
Tensile strength( MPa ) 260-300
Pultrusions
Element Value
Compressive strength( MPa ) 2200-2600
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