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Formula: Rh
Form: Sputtering Target
Material: Rhodium
CAS Number: 7440-16-6
Commodity: Precious Metals
Purity: 99.9%
Rhodium Sputtering Targets are available in 3 size variations to allow customization for different deposition processes. Made from high purity rhodium, they provide excellent corrosion resistance, reflectivity and durability. Sputtering targets like these are ideal for applications in electronics, optics and semiconductor manufacturing where a controlled thin film deposition is critical.
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Material Properties for Precious Metals

Atomic Properties
Element Value
Atomic number 45
Crystal structure Face centred cubic
Electronic structure Kr 4d⁸ 5s¹
Valences shown 2,3,4,5,6
Atomic weight( amu ) 102.9055
Thermal neutron absorption cross-section( Barns ) 150
Photo-electric work function( eV ) 4.6
Atomic radius - Goldschmidt( nm ) 0.134
Ionisation potential( No./eV ) 1/ 7.46
Ionisation potential( No./eV ) 3/ 31.1
Ionisation potential( No./eV ) 2/ 18.1
Mechanical Properties
Element Value
Material condition Hard
Material condition Soft
Poisson's ratio 0.26
Poisson's ratio 0.26
Bulk modulus( GPa ) 276
Bulk modulus( GPa ) 276
Tensile modulus( GPa ) 379
Tensile modulus( GPa ) 379
Hardness - Vickers( kgf mm⁻² ) 300
Hardness - Vickers( kgf mm⁻² ) 120
Tensile strength( MPa ) 1380-2070
Tensile strength( MPa ) 690-760
Yield strength( MPa ) 69-275
Electrical Properties
Element Value
Electrical resistivity( µOhmcm ) 4.7@20@20°C
Temperature coefficient( K⁻¹ ) 0.0044@0-100°C
Thermal emf against Pt (cold 0C - hot 100C)( mV ) 0.7
Physical Properties
Element Value
Boiling point( C ) 3727
Density( gcm⁻³ ) 12.4@20°C
Thermal Properties
Element Value
Melting point( C ) 1965
Latent heat of evaporation( J g⁻¹ ) 4800
Latent heat of fusion( J g⁻¹ ) 210
Specific heat( J K⁻¹ kg⁻¹ ) 244@25°C
Thermal conductivity( W m⁻¹ K⁻¹ ) 150@0-100°C
Coefficient of thermal expansion( x10⁻⁶ K⁻¹ ) 8.5@0-100°C

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