Tantalum Sputtering Target

Tantalum Sputtering Targets are available in 8 variations with a choice of sizes and orientations to accommodate different sputtering system configurations. These high-purity tantalum discs are ideal for thin film deposition applications like semiconductor device fabrication, optical coatings and the surface modification of materials. Tantalum's high melting point, good electrical conductivity and chemical inertness make it a versatile sputtering target material for both research and industrial applications.

Formula: Ta Form: Sputtering Target Material: Tantalum CAS Number: 7440-25-7 Commodity: Metals Product Code: TA00-ST-000100

Starting at £122.64 each

Discounts applied for volume purchases

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