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Titanium Dioxide Sputtering Target

Titanium Dioxide Sputtering Targets are thin circular disks of high purity titanium dioxide that we produce for use in sputter deposition systems. With 5 variations available, they enable precise control over film thickness and deposition rate for thin film fabrication. Titanium dioxide offers a high refractive index, photoactivity and chemical inertness. Example applications include optical coatings, photocatalysts and protective transparent films. Sputtered titanium dioxide films are used across optics, energy and biomedical sectors.
Formula: TiO₂ 99.6%
Thickness: 6.35mm
Diameter: 50.8mm
CAS Number: 13463-67-7
UOM Code: 587-230-50
SKU: 1000198581
Product Code: TI60-ST-000200
Technical Data Sheet
Safety Data Sheet
$753.78
each
  • Buy 5 for $610.56 each and save 19%
  • Buy 10 for $557.80 each and save 26%
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Material Properties for Compounds

Chemical Resistance
Element Value
Acids - concentrated Fair
Acids - dilute Good
Alkalis Poor
Metals Poor
Electrical Properties
Element Value
Dielectric constant 80-100
Volume resistivity( Ohmcm ) 10¹³-10¹⁸@25
Physical Properties
Element Value
Apparent porosity( % ) 0
Density( gcm⁻³ ) 4.05
Thermal Properties
Element Value
Melting point( C ) 1850
Thermal conductivity( W m⁻¹ K⁻¹ ) 2.5-5@20°C
Coefficient of thermal expansion( x10⁻⁶ K⁻¹ ) 8-10@20-1000°C
Mechanical Properties
Element Value
Tensile modulus( GPa ) 250-300
Hardness - Vickers( kgf mm⁻² ) 980
Tensile strength( MPa ) 350
Pultrusions
Element Value
Compressive strength( MPa ) 800-1000
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