Visit us at Booth W1369 | BCEIA 2025 | 10–12 September 2025
Goodfellow China will be exhibiting at the 21st Beijing Conference and Exhibition on Instrumental Analysis (BCEIA 2025), one of China's premier events dedicated to analytical and measurement technologies. The exhibition will be held from September 10th to 12th, 2025, at the China International Exhibition Center (Shunyi Hall) in Beijing.
Founded in 1985, BCEIA is a biennial event and one of China’s leading gatherings for analytical and measurement technologies. It hosts 700+ exhibitors and attracts 30,000–38,000 international visitors, showcasing analytical instruments, lab equipment, reagents, testing services, and related solutions. Alongside the exhibition, its scientific conference features plenary lectures, sessions, and poster presentations on analytical sciences and their applications in life sciences, precision medicine, diagnostics, food, environment, and materials. BCEIA is a key platform for product launches, networking, and industry trend discussions, attracting scientists, engineers, R&D and lab managers, QA professionals, and senior decision-makers.
Goodfellow China at BCEIA 2025
BCEIA 2025 will give Goodfellow China an opportunity to present its knowledge and solutions to the scientific community.
Visit Us at Booth W1369
- Schedule a personalized 1:1 meeting with our materials experts Leo Zhu and Abel Ni
- Explore our comprehensive range of analytical solutions and custom capabilities
Product Focus:
- Reference materials and certified reference materials (CRMs)
- Ultra-high purity metals and specialty materials for analytical applications
- Solutions for laboratories, instrument manufacturers, and research institutions
- Custom support for analytical accuracy, quality control, and materials testing
Meet Goodfellow China
Join us in Beijing to discover how our precision materials and certified reference standards can enhance your analytical capabilities. Our team is ready to discuss solutions that deliver the reliability and accuracy your most demanding applications require.
