Erbium Sputtering Target

Erbium Sputtering Target is a high-purity metallic form of erbium engineered for thin-film deposition via magnetron or ion-beam sputtering. Known for its sharp 1.54 μm optical emission, corrosion resistance, and magnetic characteristics, erbium enables the production of optically active coatings for photonics, telecommunications, and quantum devices. The sputtering target format ensures uniform erosion, low particle generation, and high deposition rates, critical for fabricating erbium-doped optical amplifiers, laser gain media, and photonic integrated circuits. Manufacturing advancements, such as grain size optimization and high-vacuum purification, enhance target density and film uniformity. Applications extend to waveguide fabrication, infrared optical filters, and specialized coatings for high-power laser systems. In research and industry, Erbium Sputtering Targets are essential for producing defect-free, compositionally precise thin films that advance optical communication, sensing, and integrated photonics technologies.