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    • Nitrides - Sputtering Target

      Sputtering Target - A high purity material used as a source for sputtering, a cold vaporization process in which atoms are physically removed from the target surface by ion bombardment.

    6 results

    Product
    Product B-60-ST-000100 Boron Nitride - Sputtering Target Thickness 3mm Diameter 25.4mm - 76.2mm
    Product SJ61-ST-000100 Silicon Nitride - Hot-pressed - Sputtering Target Thickness 3mm Diameter 25.4mm - 76.2mm
    Product SJ61-ST-000200 Silicon Nitride - Hot-pressed - Sputtering Target Thickness 6mm Diameter 25.4mm - 76.2mm
    Product TI56-ST-000100 Titanium Nitride - Sputtering Target Thickness 3mm Diameter 25.4mm - 50.8mm
    Product TI56-ST-000200 Titanium Nitride - Sputtering Target Thickness 6mm Diameter 25.4mm - 76.2mm
    Product ZR53-ST-000100 Zirconium Nitride - Sputtering Target Thickness 3mm Diameter 50.8mm
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