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CompanyGoodfellow Cambridge Ltd
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    • Silicides - Sputtering Target

      Sputtering Target - A high purity material used as a source for sputtering, a cold vapourisation process in which atoms are physically removed from the target surface by ion bombardment.

    2 results

    Product
    Product MO53-ST-000100 Molybdenum Disilicide - Sputtering Target Thickness 6mm Diameter 50mm - 75mm
    Product W-54-ST-000100 Tungsten Silicide - Sputtering Target Thickness 3mm Diameter 50.8 mm
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