Zinc Oxide/Aluminium Oxide Sputtering Target (ZnO 99/Al₂O₃ 1)

Goodfellow's Zinc Oxide/Aluminium Oxide Sputtering Target (ZnO 99/Al2O3 1) is a sputtering target with a composition of 99% ZnO and 1% Al2O3. Zinc oxide is an n-type semiconductor with a wide bandgap of 3.3 eV and high exciton binding energy. The addition of aluminium oxide improves the conductivity and thermal stability. This target's properties make it useful for applications such as transparent conducting films, gas sensors, and surface acoustic wave devices. As part of Goodfellow's range of sputtering targets, this material enables thin film deposition across a variety of industries.

Zinc Oxide/Aluminum Oxide Sputtering Target (ZnO 99/Al₂O₃ 1)

Formula: ZnO 99/Al₂O₃ 1 Form: Sputtering Target Material: Zinc Oxide/Aluminum Oxide Commodity: Ceramics Product Code: ZN61-ST-000100

Starting at €431.65 each

Discounts applied for volume purchases

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