Our Titanium Nitride Sputtering Target comes in 5 variations that differ in diameter and thickness to suit different deposition requirements. Titanium nitride coatings offer high hardness, wear resistance and golden coloration. Applications for titanium nitride sputtered films include decorative coatings, diffusion barriers in microelectronics, and protective coatings on cutting tools and medical implants. With our range of sizes, Titanium Nitride Sputtering Targets provides flexibility for thin film deposition across industrial and scientific settings.
Titanium Nitride Sputtering Target Formula: TiN Thickness: 6mm Diameter: 25.4mm Production Method: Hot Pressed CAS Number: 25583-20-4 UOM Code: 194-675-57
Titanium Nitride Sputtering Target Formula: TiN Thickness: 6mm Diameter: 50.8mm Production Method: Hot Pressed CAS Number: 25583-20-4 UOM Code: 803-862-07
Titanium Nitride Sputtering Target Formula: TiN Thickness: 3mm Diameter: 25.4mm Production Method: Hot Pressed CAS Number: 25583-20-4 UOM Code: 757-042-16
Titanium Nitride Sputtering Target Formula: TiN Thickness: 3mm Diameter: 50.8mm Production Method: Hot Pressed CAS Number: 25583-20-4 UOM Code: 350-513-52
Titanium Nitride Sputtering Target Formula: TiN Thickness: 6mm Diameter: 76.2mm Production Method: Hot Pressed CAS Number: 25583-20-4 UOM Code: 079-341-71