Skip navigation Accessibility information

Index of Materials - Sputtering-Target


A high purity material used as a source for sputtering, a cold vapourisation process in which atoms are physically removed from the target surface by ion bombardment.


Tolerances
Thickness:   ±0.5mm  
Size:   ±0.5mm  
 
See also Film   Foil   Sheet  

Sputtering Targets are available from our catalogue in the following types :

Alloy Ceramic Compound Metal

Click here to search our on-line Catalogue for items matching Sputtering-Target

Alumina ( Al2O3 )
Aluminium ( Al )
Aluminium Nitride ( AlN )
Aluminium/Silicon ( Al99/Si 1 )
Aluminium/Silicon ( Al90/Si10 )
 
Antimony ( Sb )
Barium Titanate ( BaTiO3 )
Beryllium ( Be )
Bismuth ( Bi )
Bismuth Ferrite ( BiFeO3 )
 
Boron ( B )
Boron Carbide - Hot-pressed ( B4C )
Boron Nitride ( BN )
Cadmium ( Cd )
Calcium Fluoride ( CaF2 )
 
Carbon ( C )
Cerium ( Ce )
Chromium ( Cr )
Cobalt ( Co )
Cobalt (II) Oxide ( CoO )
 
Cobalt/Iron ( Co50/Fe50 (Atomic %) )
Constantan - Resistance Alloy ( Cu55/Ni45 )
Copper ( Cu )
Dysprosium ( Dy )
Erbium ( Er )
 
Europium ( Eu )
Gadolinium ( Gd )
Germanium ( Ge )
Gold ( Au )
Gold/Palladium ( Au80/Pd20 )
 
Hafnium ( Hf )
Hafnium Oxide ( HfO2 )
Indium ( In )
Indium Oxide ( In2O3 )
Indium Oxide/Tin Oxide ( In2O3 90 /SnO2 10 )
 
Indium/Silver ( In90/Ag10 )
Indium/Tin ( In90/Sn10 )
Indium/Tin ( In95/Sn 5 )
Iridium ( Ir )
Iron ( Fe )
 
Lanthanum ( La )
Lanthanum manganite ( LaMnO3 )
Lead ( Pb )
Lead titanate ( PbTiO3 )
Lithium Cobalt Oxide ( LiCoO2 )
 
Lithium Lanthanum Zirconium Oxide ( Li7La3Zr2O12 )
Lithium Manganese Oxide ( LiMn2O4 )
Lithium Nickel Manganese Oxide ( LiNi0.5Mn1.5O4 )
Lithium Orthosilicate ( Li4SiO4 )
Lithium Phosphate ( Li3PO4 )
 
Lithium titanium oxide ( Li4Ti5O12 )
Magnesium ( Mg )
Magnesium Oxide ( MgO )
Manganese ( Mn )
Manganese/Iron ( Mn80/Fe20 )
 
Molybdenum ( Mo )
Molybdenum Disilicide ( MoSi2 )
Neodymium ( Nd )
Neodymium/Iron/Boron ( Nd2Fe14B )
Nickel ( Ni )
 
Nickel Oxide ( NiO )
Nickel/Chromium ( Ni80/Cr20 )
Nickel/Iron ( Ni80/Fe20 )
Nickel/Iron/Molybdenum ( Ni80/Fe15.5/Mo 4.5 )
Nickel/Vanadium ( Ni93/V 7 )
 
Niobium ( Nb )
Palladium ( Pd )
Platinum ( Pt )
Praseodymium ( Pr )
Quartz - Fused ( SiO2 )
 
Rhenium ( Re )
Rhodium ( Rh )
Ruthenium ( Ru )
Samarium ( Sm )
Samarium ferrite ( SmFeO3 )
 
Selenium ( Se )
Silicon ( Si )
Silicon Carbide - Hot-pressed ( SiC )
Silicon Nitride - Hot-pressed ( Si3N4 )
Silver ( Ag )
 
T1 - Thermocouple Alloy ( Ni90/Cr10 )
T2 - Thermocouple Alloy ( Ni95/(Al+Mn+Si) 5 )
Tantalum ( Ta )
Tantalum Pentoxide ( Ta2O5 )
Tellurium ( Te )
 
Terbium ( Tb )
Thulium ( Tm )
Tin ( Sn )
Tin Oxide ( SnO2 )
Titanium ( Ti )
 
Titanium Boride ( TiB2 )
Titanium Diboride ( TiB2 )
Titanium Dioxide ( TiO2 99.6% )
Titanium Nitride ( TiN )
Tungsten ( W )
 
Tungsten Carbide/Cobalt ( WC 94/Co 6 )
Tungsten Silicide ( WSi2 )
Tungsten Trioxide ( WO3 )
Uranium ( U )
Vanadium ( V )
 
Ytterbium ( Yb )
Yttrium ( Y )
Yttrium ferrite ( Y3Fe5O12 )
Zinc ( Zn )
Zinc Oxide ( ZnO )
 
Zinc Oxide / Gallium Oxide 2% - GZO ( ZnO 98 / Ga2O3 2 )
Zinc Oxide/Aluminium Oxide ( ZnO 98/Al2O3 2 )
Zinc Oxide/Aluminium Oxide ( ZnO 99/Al2O3 1 )
Zinc/Aluminium ( Zn98/Al 2 )
Zirconia - stabilised with Yttria ( ZrO2/Y2O3 )
 
Zirconium ( Zr )
Zirconium Nitride ( ZrN )
 

Click here to search our on-line Catalogue for items matching Sputtering-Target

Sputtering Targets are available from our catalogue in the following types :

Alloy Ceramic Compound Metal

 
See also Film   Foil   Sheet  

Index