A high purity material used as a source for sputtering, a cold vapourisation process in which atoms are physically removed from the target surface by ion bombardment.
Tolerances | ||||
Thickness: | ±0.5mm | |||
Size: | ±0.5mm |
See also | Film | Foil | Sheet |
Sputtering Targets are available from our catalogue in the following types :
Alloy | Ceramic | Compound | Metal |
Click here to search our on-line Catalogue for items matching Sputtering-Target
Click here to search our on-line Catalogue for items matching Sputtering-Target
Sputtering Targets are available from our catalogue in the following types :
Alloy | Ceramic | Compound | Metal |
See also | Film | Foil | Sheet |