Index of Materials - Sputtering Target
A high purity material used as a source for sputtering, a cold vapourisation process in which atoms are physically removed from the target surface by ion bombardment.
| Tolerances | ||||
| Thickness: | ±0.5mm | |||
| Size: | ±0.5mm |
| See also | Sheet |
Sputtering Targets are available from our catalogue in the following types :
| Alloy | Ceramic | Compound | Metal |
Click here to search our on-line Catalogue for items matching Sputtering Target
Click here to search our on-line Catalogue for items matching Sputtering Target
Sputtering Targets are available from our catalogue in the following types :
| Alloy | Ceramic | Compound | Metal |
| See also | Sheet |