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Index of Materials - Sputtering-Target

A high purity material used as a source for sputtering, a cold vapourisation process in which atoms are physically removed from the target surface by ion bombardment.

Tolerances
Thickness:		±0.5mm
Size:		±0.5mm


See also	Film		Foil		Sheet

Sputtering Targets are available from our catalogue in the following types :

Click here to search our on-line Catalogue for items matching Sputtering-Target

Alumina ( Al₂O₃ )

Aluminium ( Al )

Aluminium Nitride ( AlN )

Aluminium/Silicon ( Al99/Si 1 )

Aluminium/Silicon ( Al90/Si10 )

Antimony ( Sb )

Barium Titanate ( BaTiO₃ )

Beryllium ( Be )

Bismuth Ferrite ( BiFeO₃ )

Boron Carbide - Hot-pressed ( B₄C )

Boron Nitride ( BN )

Calcium Fluoride ( CaF₂ )

Chromium ( Cr )

Cobalt (II) Oxide ( CoO )

Cobalt/Iron ( Co50/Fe50 (Atomic %) )

Constantan - Resistance Alloy ( Cu55/Ni45 )

Dysprosium ( Dy )

Europium ( Eu )

Gadolinium ( Gd )

Germanium ( Ge )

Gold/Palladium ( Au80/Pd20 )

Hafnium Oxide ( HfO₂ )

Indium Oxide ( In₂O₃ )

Indium Oxide/Tin Oxide ( In₂O₃ 90 /SnO₂ 10 )

Indium/Silver ( In90/Ag10 )

Indium/Tin ( In90/Sn10 )

Indium/Tin ( In95/Sn 5 )

Lanthanum ( La )

Lanthanum manganite ( LaMnO₃ )

Lead titanate ( PbTiO₃ )

Lithium Cobalt Oxide ( LiCoO₂ )

Lithium Lanthanum Zirconium Oxide ( Li₇La₃Zr₂O₁₂ )

Lithium Manganese Oxide ( LiMn₂O₄ )

Lithium Nickel Manganese Oxide ( LiNi₀.₅Mn₁.₅O₄ )

Lithium Orthosilicate ( Li₄SiO₄ )

Lithium Phosphate ( Li₃PO₄ )

Lithium titanium oxide ( Li₄Ti₅O₁₂ )

Magnesium ( Mg )

Magnesium Oxide ( MgO )

Manganese ( Mn )

Manganese/Iron ( Mn80/Fe20 )

Molybdenum ( Mo )

Molybdenum Disilicide ( MoSi₂ )

Neodymium ( Nd )

Neodymium/Iron/Boron ( Nd₂Fe₁₄B )

Nickel Oxide ( NiO )

Nickel/Chromium ( Ni80/Cr20 )

Nickel/Iron ( Ni80/Fe20 )

Nickel/Iron/Molybdenum ( Ni80/Fe15.5/Mo 4.5 )

Nickel/Vanadium ( Ni93/V 7 )

Palladium ( Pd )

Platinum ( Pt )

Praseodymium ( Pr )

Quartz - Fused ( SiO₂ )

Ruthenium ( Ru )

Samarium ( Sm )

Samarium ferrite ( SmFeO₃ )

Selenium ( Se )

Silicon Carbide - Hot-pressed ( SiC )

Silicon Nitride - Hot-pressed ( Si₃N₄ )

T1 - Thermocouple Alloy ( Ni90/Cr10 )

T2 - Thermocouple Alloy ( Ni95/(Al+Mn+Si) 5 )

Tantalum ( Ta )

Tantalum Pentoxide ( Ta₂O₅ )

Tellurium ( Te )

Tin Oxide ( SnO₂ )

Titanium ( Ti )

Titanium Boride ( TiB₂ )

Titanium Diboride ( TiB₂ )

Titanium Dioxide ( TiO₂ 99.6% )

Titanium Nitride ( TiN )

Tungsten Carbide/Cobalt ( WC 94/Co 6 )

Tungsten Silicide ( WSi₂ )

Tungsten Trioxide ( WO₃ )

Ytterbium ( Yb )

Yttrium ferrite ( Y₃Fe₅O₁₂ )

Zinc Oxide ( ZnO )

Zinc Oxide / Gallium Oxide 2% - GZO ( ZnO 98 / Ga2O3 2 )

Zinc Oxide/Aluminium Oxide ( ZnO 98/Al₂O₃ 2 )

Zinc Oxide/Aluminium Oxide ( ZnO 99/Al₂O₃ 1 )

Zinc/Aluminium ( Zn98/Al 2 )

Zirconia - stabilised with Yttria ( ZrO₂/Y₂O₃ )

Zirconium ( Zr )

Zirconium Nitride ( ZrN )

Click here to search our on-line Catalogue for items matching Sputtering-Target

Sputtering Targets are available from our catalogue in the following types :


See also	Film		Foil		Sheet

Index

A
B
C
D
E
F
G
H
I
J
K
L
M
N
O
P
Q
R
S
T
U
V
W
X
Y
Z