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Index of Materials - SiO2 (300nm)/Si wafer (standard) - Substrate




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GR001010Graphene Film,    
Thickness:0.525mm, Monolayer thickness:2-3nm, Substrate:SiO2 (300nm)/Si wafer (standard), Film morphology:Continuous monolayer >95%, Sheet resistance:Av. <250-400 ohms/sq (after transfer), Mobility:>3500cm2/Vs, Transmittance:>97%, Domain size:10-20µm

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