Index of Materials - Compound - Sputtering Targets
Sputtering Target
A high purity material used as a source for sputtering, a cold vapourisation process in which atoms are physically removed from the target surface by ion bombardment.
| Tolerances | ||||
| Thickness: | ±0.5mm | |||
| Size: | ±0.5mm |
| See also | Sheets |
Click here to search our on-line Catalogue for items matching - Compound - Sputtering Targets
| Indium-Oxide |
| Indium-Oxide-Tin-Oxide |
| Magnesium-Oxide |
| Molybdenum-Disilicide |
| Nickel-Oxide |
| Tantalum-Pentoxide |
| Tin-Oxide |
| Titanium-Boride |
| Titanium-Nitride |
| Tungsten-Trioxide |
| Zinc-Oxide |
| Zirconium-Nitride |
Click here to search our on-line Catalogue for items matching - Compound - Sputtering Targets
| See also | Sheets |