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Index of Materials - Ceramic - Sputtering-Targets

Ceramic

Ceramics are non-organic, non-metallic materials which show excellent resistance to high temperatures, abrasives and chemicals. They have comparatively low densities and are extremely hard. The nature of their structure means that some show poor shock resistance.

Sputtering Target

A high purity material used as a source for sputtering, a cold vapourisation process in which atoms are physically removed from the target surface by ion bombardment.

Tolerances
Thickness:   ±0.5mm  
Size:   ±0.5mm  
 
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Alumina
Boron Carbide - Hot-pressed
Boron Nitride
Quartz - Fused
Silicon Carbide - Hot-pressed
 
Silicon Nitride - Hot-pressed
Titanium Diboride
Titanium Dioxide
Tungsten Carbide/Cobalt
Zinc Oxide/Aluminium Oxide
 
Zinc Oxide/Aluminium Oxide
Zinc Oxide/Aluminium Oxide
Zirconia - stabilised with Yttria
 

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See also Films   Foils   Sheets  

Index