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Index of Materials - Sputtering-Target


A high purity material used as a source for sputtering, a cold vaporization process in which atoms are physically removed from the target surface by ion bombardment.


Tolerances
Thickness:   ±0.5mm  
Size:   ±0.5mm  
 
See also Film   Foil   Sheet  

Sputtering Targets are available from our catalog in the following types :

Alloy Ceramic Compound Metal

Click here to search our on-line Catalog for items matching Sputtering-Target

Alumina ( Al2O3 )
Aluminum ( Al )
Aluminum Nitride ( AlN )
Aluminum/Silicon ( Al99/Si 1 )
Aluminum/Silicon ( Al90/Si10 )
 
Antimony ( Sb )
Beryllium ( Be )
Bismuth ( Bi )
Boron ( B )
Boron Carbide - Hot-pressed ( B4C )
 
Boron Nitride ( BN )
Cadmium ( Cd )
Calcium Fluoride ( CaF2 )
Carbon ( C )
Cerium ( Ce )
 
Chromium ( Cr )
Cobalt ( Co )
Cobalt (II) Oxide ( CoO )
Cobalt/Iron ( Co50/Fe50 (Atomic %) )
Constantan® - Resistance Alloy ( Cu55/Ni45 )
 
Copper ( Cu )
Dysprosium ( Dy )
Erbium ( Er )
Europium ( Eu )
Gadolinium ( Gd )
 
Germanium ( Ge )
Gold ( Au )
Gold/Palladium ( Au80/Pd20 )
Hafnium ( Hf )
Hafnium Oxide ( HfO2 )
 
Indium ( In )
Indium Oxide ( In2O3 )
Indium Oxide/Tin Oxide ( In2O3 90 /SnO2 10 )
Indium/Silver ( In90/Ag10 )
Indium/Tin ( In90/Sn10 )
 
Indium/Tin ( In95/Sn 5 )
Iridium ( Ir )
Iron ( Fe )
Lanthanum ( La )
Lead ( Pb )
 
Lithium Phosphate ( Li3PO4 )
Magnesium ( Mg )
Magnesium Oxide ( MgO )
Manganese ( Mn )
Manganese/Iron ( Mn80/Fe20 )
 
Molybdenum ( Mo )
Molybdenum Disilicide ( MoSi2 )
Neodymium ( Nd )
Neodymium/Iron/Boron ( Nd2Fe14B )
Nickel ( Ni )
 
Nickel Oxide ( NiO )
Nickel/Chromium ( Ni80/Cr20 )
Nickel/Iron ( Ni80/Fe20 )
Nickel/Iron/Molybdenum ( Ni80/Fe15.5/Mo 4.5 )
Nickel/Vanadium ( Ni93/V 7 )
 
Niobium ( Nb )
Palladium ( Pd )
Platinum ( Pt )
Praseodymium ( Pr )
Quartz - Fused ( SiO2 )
 
Rhenium ( Re )
Rhodium ( Rh )
Ruthenium ( Ru )
Samarium ( Sm )
Selenium ( Se )
 
Silicon ( Si )
Silicon Carbide - Hot-pressed ( SiC )
Silicon Nitride - Hot-pressed ( Si3N4 )
Silver ( Ag )
T1 - Thermocouple Alloy ( Ni90/Cr10 )
 
T2 - Thermocouple Alloy ( Ni95/(Al+Mn+Si) 5 )
Tantalum ( Ta )
Tantalum Pentoxide ( Ta2O5 )
Tellurium ( Te )
Terbium ( Tb )
 
Thulium ( Tm )
Tin ( Sn )
Tin Oxide ( SnO2 )
Titanium ( Ti )
Titanium Boride ( TiB2 )
 
Titanium Diboride ( TiB2 )
Titanium Dioxide ( TiO2 99.6% )
Titanium Nitride ( TiN )
Tungsten ( W )
Tungsten Carbide/Cobalt ( WC 94/Co 6 )
 
Tungsten Silicide ( WSi2 )
Tungsten Trioxide ( WO3 )
Tungsten/Titanium ( W 90/Ti10 )
Uranium ( U )
Vanadium ( V )
 
Ytterbium ( Yb )
Yttrium ( Y )
Zinc ( Zn )
Zinc Oxide ( ZnO )
Zinc Oxide / Gallium Oxide 2% - GZO ( ZnO 98 / Ga2O3 2 )
 
Zinc Oxide/Aluminium Oxide ( ZnO 99/Al2O3 1 )
Zinc Oxide/Aluminium Oxide ( ZnO 96/Al2O3 4 )
Zinc Oxide/Aluminum Oxide ( ZnO 98/Al2O3 2 )
Zinc/Aluminum ( Zn98/Al 2 )
Zirconia - stabilized with Yttria ( ZrO2/Y2O3 )
 
Zirconium ( Zr )
Zirconium Nitride ( ZrN )
 

Click here to search our on-line Catalog for items matching Sputtering-Target

Sputtering Targets are available from our catalog in the following types :

Alloy Ceramic Compound Metal

 
See also Film   Foil   Sheet  

Index