Skip navigation Accessibility information

Index of Materials - Metal - Sputtering-Targets

Metal

A metal is generally considered to be a pure element which readily forms cations. Metals are characterised by their opacity and high thermal and electrical conductivities, the latter properties resulting from the delocalised and mobile nature of the electrons over the crystal structure.

Sputtering Target

A high purity material used as a source for sputtering, a cold vaporization process in which atoms are physically removed from the target surface by ion bombardment.

Tolerances
Thickness:   ±0.5mm  
Size:   ±0.5mm  
 
See also Films   Foils   Sheets  

Click here to search our on-line Catalog for items matching - Metal - Sputtering-Targets


Aluminum
Antimony
Beryllium
Bismuth
Boron
 
Cadmium
Carbon
Cerium
Chromium
Cobalt
 
Copper
Dysprosium
Erbium
Europium
Gadolinium
 
Germanium
Gold
Hafnium
Indium
Iridium
 
Iron
Lanthanum
Lead
Magnesium
Manganese
 
Molybdenum
Neodymium
Nickel
Niobium
Palladium
 
Platinum
Praseodymium
Rhenium
Rhodium
Ruthenium
 
Samarium
Selenium
Silicon
Silver
Tantalum
 
Tellurium
Terbium
Thulium
Tin
Titanium
 
Tungsten
Uranium
Vanadium
Ytterbium
Yttrium
 
Zinc
Zirconium
 

Click here to search our on-line Catalog for items matching - Metal - Sputtering-Targets

 
See also Films   Foils   Sheets  

Index