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Index of Materials - Compound - Sputtering-Targets

Compound

Goodfellow supplies a wide of compounds, mainly as powder, lump, sputtering target or single crystal, but other forms may be available on request. Our website details those which are available ex-stock for immediate despatch. Please contact us with details of your requirements.

Sputtering Target

A high purity material used as a source for sputtering, a cold vaporization process in which atoms are physically removed from the target surface by ion bombardment.

Tolerances
Thickness:   ±0.5mm  
Size:   ±0.5mm  
 
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Aluminum Nitride
Calcium Fluoride
Cobalt (II) Oxide
Hafnium Oxide
Indium Oxide
 
Indium Oxide/Tin Oxide
Magnesium Oxide
Molybdenum Disilicide
Nickel Oxide
Tantalum Pentoxide
 
Tin Oxide
Titanium Boride
Titanium Nitride
Tungsten Silicide
Tungsten Trioxide
 
Zinc Oxide
Zinc Oxide / Gallium Oxide 2% - GZO
Zirconium Nitride
 

Click here to search our on-line Catalog for items matching - Compound - Sputtering-Targets

 
See also Films   Foils   Sheets  

Index