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Index of Materials - Ceramic - Sputtering-Targets

Ceramic

Ceramics are non-metallic, non-organic materials.

They exhibit excellent resistance to high temperatures. Although they have comparatively low densities, they are extremely hard but tend to be brittle. They show good resistance to both abrasives and chemicals.

Sputtering Target

A high purity material used as a source for sputtering, a cold vaporization process in which atoms are physically removed from the target surface by ion bombardment.

Tolerances
Thickness:   ±0.5mm  
Size:   ±0.5mm  
 
See also Films   Foils   Sheets  

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Alumina
Boron Carbide - Hot-pressed
Boron Nitride
Quartz - Fused
Silicon Carbide - Hot-pressed
 
Silicon Nitride - Hot-pressed
Titanium Diboride
Titanium Dioxide
Tungsten Carbide/Cobalt
Zinc Oxide/Aluminium Oxide
 
Zinc Oxide/Aluminium Oxide
Zinc Oxide/Aluminum Oxide
Zirconia - stabilized with Yttria
 

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See also Films   Foils   Sheets  

Index